Hello everybody:
       We used CrystalBondTM509 as the glue between quartz and silicon
during the anisotropic etching of silicon in 75°C KOH solution. After
about 2 hours anisotropic etching, most glue can be remove in acetone
which is protected. But, Some CrystalBond509 ,which is exposed to the
KOH solution, can’t be removed completely.  This residues are very
unwelcoming in the following process.
Does anyone have experiences about the stripping of CrystalBond 509? Any
suggestion are appreciated.

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                     Mr. K.L.Zheng
 Dept. of Precision Machinery and Precision Instrumentation
 University of Science and Technology of China
 Hefei, Anhui Province, 230027,  P.R.China
 E-Mail: zhengkl@mail.ustc.edu.cn 

 Tel: +86-551-3607405  Fax: +86-551-3607504
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