I encountered a strange problem when I was trying to sputter Si or Silver thin
films on to a 0211 glass wafer where silver was removed by wet etching(ammonim
hydroxide plus hyrogen peroxide). I haven't seen any films over the area where
the Ag was removed after enough time of deposition. I not sure whether it is
because of the wafer is not clean or something else was left on the wafer during
the wet etching. Is there anybody have the same experience?
Thanks

Bing