Hi
You dont need to buy a special tool to do the Vapor Phase
etching of SiO2 with HF. You can use the cleaning module of
any comercial cluster tool which are available in most
university Nanofabs at a more reasonable rate than the
industry.
You can use a mixture of anhydrous HF & methanol. Let me
know if you have any specific questions. I did my masters
thesis in this area
Good Luck
Anupama
>
>
> -------Original Message-------
>
> From: General MEMS discussion
> Date: Wednesday, July 09, 2003 10:34:15 AM
> To: General MEMS discussion
> Subject: Re: [mems-talk] Used equipment for HF vapor dry
> etch of SiO2
>
> ?
> There are several options for HF vapor etching:
>
> 1. Pour some 49% HF into a non-glass beaker.
> Hold the wafer over the beaker for 15 s.
> Remove for 15 s (this prevents condensation).
> Repeat until done, which may be an hour.
> Variations have done using heating of the wafer.
>
> 2. Buy a commercial system. The only one I know is
> the Excalibur from FSI International of Chaska, Minnesota.
> These are relatively new, so don't count on finding a used
> one (unless one of the dead optical-switch start-ups has
> one).
>
> --Kirt Williams, Ph.D. consultant
> ----- Original Message -----
> From: Changping
> To: [email protected]
> Sent: Tuesday, July 08, 2003 8:12 AM
> Subject: [mems-talk] Used equipment for HF vapor dry etch
> of SiO2
>
>
> Hi,
>
> I am wondering if any body know where there is such an
> equipment for sale. What we need to do is to do SiO2
> sacrificial etch by HF vapor. We've a limited budget so we
> prefer an used equipment with low price.
>
> Thank you very much and appreciate your reply!
>
> Changping
>
>
>
>
>
>
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