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MEMSnet Home: MEMS-Talk: Mask Clean
Mask Clean
2003-07-31
Lin, Yaojian
2003-07-31
Mighty Platypus
2003-07-31
Hong Wu
2003-07-31
Kirt & Erika Zipf-Williams
2003-08-04
Marcus
2003-07-31
anupama@ee.washington.edu
2003-08-01
hengcw
Silicic acid for TMAH etch
2003-08-03
kris
2003-08-01
BobHendu@aol.com
Mask Clean
Kirt & Erika Zipf-Williams
2003-07-31
For chrome masks, we have cleaned using Piranha
(120 deg C, ~5 H2SO4 : 1 H2O2) for 10 minutes.
This is very effective at removing organics.
Don't leave the mask in overnight: chromium is etched slowly in Piranha.

Kirt Williams, Ph.D.   consultant

> On Thu, 31 Jul 2003, Lin, Yaojian wrote:
>
> > Hello Friends,
> >
> > I am looking for the methods to clean the dirty mask, which may have
some
> > polymer spots.
> >
> > Could you please give me some clue?
> >
> > With many thanks,
> >
> > Yaojian Lin
> >
> >
> >
> >
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