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MEMSnet Home: MEMS-Talk: Mask Clean
Mask Clean
2003-07-31
Lin, Yaojian
2003-07-31
Mighty Platypus
2003-07-31
Hong Wu
2003-07-31
Kirt & Erika Zipf-Williams
2003-08-04
Marcus
2003-07-31
[email protected]
2003-08-01
hengcw
Silicic acid for TMAH etch
2003-08-03
kris
2003-08-01
[email protected]
Mask Clean
[email protected]
2003-08-01
Cleaning a chrome mask in Sulfuric/peroxide is a very effective way to remove
photoresist and other organic particles. Be careful when preparing the solution
as it is exothermic and will heat to 120 degrees C quickly. You might want to
allow it to cool before using as the shock at that temperature can break the
glass. Same with removing it from solution. Have a heated beaker of di water to
transfer the mask to before placing in your normal di water dump rinser. Bob
Henderson

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