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MEMSnet Home: MEMS-Talk: Double Sided Photoresist Processing
Double Sided Photoresist Processing
2003-08-06
[email protected]
Double Sided Photoresist Processing
[email protected]
2003-08-06
Hi y'all,

We are looking to upgrade and improve our resist coating process
(double sided) from our current dunk coat to a more "updated" (and cost
effective) one.
I'd very much like to get as much input and feedback from your experiences.
Required process - Negative  and Positve resist @ 3 - 5 microns, compatible
with  Class 100 type requirements and > 5 micron feature size.

Thanks in advance,

a l

Avi Laker
Teccor Electronics
972 756 8237   Office
214 439 6770   Pager



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