Hello Everyone,

We have problems regarding Aluminium mask patterning with wet etching. We use
AZ5214 or AZ1518 photoresist, but Aluminium patterns are always undercutting
when we use Phosphoric acid(85%). It seems that the adhesion betweem Aluminium
film and resist are weak. we do not try HMDS at present. I would apprecaite any
advice with good Aliminium patterns with wet or dry etching.

With regards

Yinlan Ruan
Laser Physics Center
Research School of Physical Science and Engineering
The Australian National University
Tel:61-2-61254079
Fax:61-2-61250029