Professor Judy,

IntelliSense Corporation has developed a bulk silicon etch simulator called
AnisE.  With AnisE, you can layout your microstructure or import GDS II and
DXF mask layout files.  AnisE automatically simulates etching under different
times, temperatures, and concentrations of etchant.  An etch database of KOH
and TMAH is provided for the user.   It uses a molecular approach to etch
simulation which mimics the actual etching planes with higher accuracy than
the conventional etch plane approximation.

AnisE provides 2D "real-time" visualization of the etched structure as the
etching proceeds and a 3D visualization of the final etched structure.  This
3D structure enables the user to determine etch depths and feature
measurements.  AnisE is capable of simulating undercutting and corner
compensation.  Many successful test results are available from a wide
audience.

For more information, please contact me.


Sincerely,

James Marchetti,
Applications Engineer
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IntelliSense Corporation
16 Upton Drive
Wilmington, MA  01887
(978)988-8000 
(978)988-8001 
www.intellis.com
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