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MEMSnet Home: MEMS-Talk: Re: AZ4620 (Han Chong)
Re: AZ4620 (Han Chong)
2003-11-25
Han Woo Chong
Re: AZ4620 (Han Chong)
Han Woo Chong
2003-11-25
Message: 4

Hi Jacob,

At RMIT University, we have programmable spinner with co-rotating cover in our
cleanroom facility and we have constantly using AZ P4620. Feel free to contact
me if you wish to discuss about this.

regards

Han Chong

RMIT University
School of Elec. and Com. Eng. (SECE)
Melbourne, Victoria
Australia

phone:03 9925 2896
[email protected]

-----Original Message-----
From: [email protected] [mailto:mems-talk-
[email protected]]On Behalf Of Koby Harel
Sent: Sunday, November 23, 2003 2:06 AM
To: [email protected]
Subject: [mems-talk] AZ4620

Hi all,

I need to fabricate microlens (~400 Micron) and I will use a thick positive
AZP4620 photoresist for that purpose.

1.     I need the spinning curve to deposit AZP4620 in thickness ranging 20-40
Microns,
2.    Is there a difference between AZ4620 to AZP4620 regarding that or is it
essentially the same photoresist ?

Thanks
Jacob Harel

Minifab
Scoresby
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