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MEMSnet Home: MEMS-Talk: wafer bonding, wafer flatness requirement?
wafer bonding, wafer flatness requirement?
2003-12-09
Melvin DeSilva
2003-12-10
Kenneth Smith
2003-12-12
Paolo Bondavalli
2003-12-10
BRIAN DOUGLAS
2003-12-12
BRAD JOHNSON
wafer bonding, wafer flatness requirement?
Paolo Bondavalli
2003-12-12
Hello,
We have the same kind of problem using adhesive bonding procedure.
We found out a no-well bonded area near the center pin position.
The TTV is less than 1µm, the problem could be related to the central pin I
think but it's under investigation.
Best Regards.


Kenneth Smith a écrit :

> Melvin,
>
> It is likely that your wafers are not flat enough as you suspect. For
> Bonding- wafers should have TTV < 2um and preferablly <1um- which is
> best obtained with Double Side Polished wafers.
>
> Ken
>
> Melvin DeSilva wrote:
> >
> > Hello,
> >
> > I need to do Au-Au thermal compression bond using Karl Suss bonder.
> > Sometimes the bonding is not uniform across the wafer.  I understand
> > that it could have been caused by particles on the wafer or film
> > uniformity, etc.  My question is:
> >
> > Is there a requirement for wafer flatness (TTV less than ?? um) in order
> > to achieve a uniform bond.  Any comments and suggestions are appreciated.
> >
> > Melvin
> >
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--
*********************************************************
Dr. Paolo Bondavalli
R&D MEMS Engineer
MICROTEC MEMS
THALES (ex THOMSON-CSF) CORPORATE RESEARCH CENTER
Domaine de Corbeville,
Route Departementale 128
F91404 ORSAY
(FRANCE)
Tel : 01 69 33 08 63
Fax : 01 69 33 08 62
Email : [email protected]
**********************************************************
Disclaimer: Opinions expressed herein are my own and may
  not represent those of my employer.
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