Hi All.
Does anybody knows about how we can effectively clean copper pads from its
native oxide by wet stripping? We cannot use no HF based solutions, since we
also have silicon dioxide on the surface that must remain there. Any suggestions
will be welcomed.
Thank you in advance
________________________________________________________________________________
_
______________________
Mark Schvartzman
Process engineer
GWS Photonics Inc.
Paz Towers, 33, Bezalel st.
Ramat-Gan, 52581, Israel
Tel. 972-3-7534440
Cell. 972-58-699748
E-mail: [email protected]


> "This message, together with its attachments, may contain proprietary
confidential information owned by GWS Photonics Inc. or its subsidiaries and
therefore you are not entitled to disclose it to any third party.
> If you are not the intended recipient or you have received this message in
error, then please notify us immediately by e-mail to [email protected] and
delete all copies of this message and its attachments."
>