5 % H2SO4 for 5 - 10 seconds will clean the copper oxide. Once you see shiny
color on copper surface, take the sample out and rinse with DI. Then dry by
N2 blower and in oven.

Best regards.

Daniel Sang-Won Park
Graduate Research Assistant
UTD MiNDS (http://www.utdallas.edu/~jblee/research/index.html) Lab
[E-mail] [email protected]
[Web] http://www.utdallas.edu/~spark



----- Original Message -----
From: "Mark Schvartzman" 
To: "General MEMS discussion" 
Sent: Wednesday, January 14, 2004 7:08 AM
Subject: [mems-talk] Copper oxide stripping


Hi All.
Does anybody knows about how we can effectively clean copper pads from its
native oxide by wet stripping? We cannot use no HF based solutions, since we
also have silicon dioxide on the surface that must remain there. Any
suggestions will be welcomed.
Thank you in advance
____________________________________________________________________________
_____
______________________
Mark Schvartzman
Process engineer
GWS Photonics Inc.
Paz Towers, 33, Bezalel st.
Ramat-Gan, 52581, Israel
Tel. 972-3-7534440
Cell. 972-58-699748
E-mail: [email protected]


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