Mark,
     I have customers using our plasma equipment with Hydrogen containing plasma
gasses to reduce copper oxide and remove it.  Contact me directly and I will go
into more commercial details.  Bill Moffat

-----Original Message-----
From: Mark Schvartzman [mailto:[email protected]]
Sent: Wednesday, January 14, 2004 5:08 AM
To: General MEMS discussion
Subject: [mems-talk] Copper oxide stripping


Hi All.
Does anybody knows about how we can effectively clean copper pads from its
native oxide by wet stripping? We cannot use no HF based solutions, since we
also have silicon dioxide on the surface that must remain there. Any suggestions
will be welcomed.
Thank you in advance
________________________________________________________________________________
_
______________________
Mark Schvartzman
Process engineer
GWS Photonics Inc.
Paz Towers, 33, Bezalel st.
Ramat-Gan, 52581, Israel
Tel. 972-3-7534440
Cell. 972-58-699748
E-mail: [email protected]


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