Hello friends

I have a simple question. I want to deposition/pattern of Al metal 1, layer
of thickness 1.5um on si substrate, Deposition/pattern of polymide (A type of
polymer used as a sacrificial layer with Al ) of 1um thickness and
Deposition/pattern of metal 2 layer of thickness 1.5um. I want to get final
structure if
polymide layer is entirely removed after patterning of metal 2. I know this is
very simple question. but i am a new learner in this MEMS area. I would
appriciate if someone describe me entire process step by step by using
photolithography. The first metal mask is light field mask (design of polygon,
square and
three circle) second polymide mask is dark field (design of two small square
and three circle) and third metal mask is light field (design of ractangle,
triangle,  two circle and plus sign).

wirh regards
piyush