Leidong Mao,

Since your second layer is thinner than your first, I would recommend performing
development following the PEB of the second layer.  Since SU-8 is nearly
impervious after exposure and PEB, you don't need to worry about the second
layer process affecting the first.


Best Regards,

Chad Brubaker

EV Group       invent * innovate * implement
Technology - Tel: (602) 437-9492, Fax: (602)437-9435 e-mail:
C.Brubaker@EVGroup.com, www.EVGroup.com

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 -----Original Message-----
From:   mems-talk-bounces+c.brubaker=evgroup.com@memsnet.org [mailto:mems-talk-
bounces+c.brubaker=evgroup.com@memsnet.org]  On Behalf Of leidongmao@yahoo.com
Sent:   Tuesday, February 03, 2004 11:35 AM
To:     mems-talk@memsnet.org
Subject:        [mems-talk] 2 level SU-8 lithography

Hello All.

              I am working on 2 level SU-8 lithography now. The first
layer is about 50um thick and have a feature size of 50um; the second
layer is 10-20um thickness, the feature size is about 25um.

              I need suggestions right now. Should I develop both layers
at once after PEB of second layer, or can I develop the first layer and
spin on the second?

              Also is there any particular precautions I should take in
2 level SU-8 lithography?

              I also appreciate if someone can suggest related
literatures.

best,
Leidong Mao


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