A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: Re: overhanging
Re: overhanging
1997-02-17
Shekhar Bhansali
1997-02-20
Joachim Quenzer
1997-02-22
Ying Xu
1997-02-27
IGAL R. CHERTKOW
Re: overhanging
IGAL R. CHERTKOW
1997-02-27
Dear HELIN,

There is a Positive photoresist Known as PMGI sold by "Microlithography
Chemical Corp."
It is used in liftoff together with other PH.R. maybe this is what you
need.
Contact Jack Ross tel: (617)965 5511 fax (617) 965 5818
E-mail jer@microchem.com

On Sat, 15 Feb 1997, Mr Philippe HELIN wrote:

>
> Does anyone know how to make an overhanging using two photoresists to =
> realize a lift-off.
> Could you please inform me on the followings :
> * Photoresists, manufacturer
> * exposure time, wavelength
> * remover
> * and so on
>
> Thanks
>
> Philippe HELIN
> IEMN
> Avenue Poincar=E9, BP 69
> 59652 Villeneuve d'Ascq, FRANCE
> fax : 333 20 19 78 78
> Email : helin@iemn.univ-lille1.fr
>
>
>


reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Harrick Plasma, Inc.
University Wafer
MEMStaff Inc.
Tanner EDA by Mentor Graphics