Dear Colleagues:

I am looking to deposit silicon by chemical vapor deposition into pre-cast
structures.  The thickness of the deposited silicon will range from 500
microns to 5 mm.  Issues associated with aspect ratio and "key-holing" will
be part of the experimental effort.

Any takers?

Thanks.


Robert S. Okojie, Ph.D.
NASA-Glenn Research Center
Sensors and Electronics Branch
21000 Brookpark Road, M/S 77-1
Cleveland, OH 44135.
Ph: 216/433-6522;       Fax: 216/433-8643
e-mail: robert.okojie@grc.nasa.gov
http://www.lerc.nasa.gov/WWW/SiC/SiC.html