Hi Members,

I am working as a JPA in a MEMS research Project entitled " Febrication  of a
Silicon Micromechanical Tunneling Accelerometer" in the Microelectronics Centre,
E & ECE department,IIT Kharagpur. We are trying to etch silicon wafer from
bothside in KOH solution(44%wt)at room temperature.Can anyone help in this
regard? Does any body have experience in KOH etching of silicon at room
Temp(what is the etch rate ).Please send information  or Suggestions

Thanking you

Debasish Paul                                               Microelectronics Lab
E & ECE Depertment
IIT Kharagpur-721302
Phone:03222-281479(Lab)
      +919434161452(M)



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