Hi,  Thank you for your responses to my question about etching Silicon without
affecting Alumina (Al2O3).  Several people suggested using SF6 dry etch.  I do
have SF6 available in an ICP that is typically used to run the Bosch process for
deep trench etching.  The system can easily be used without the passivation step
to allow for an isotropic etch with SF6.  Does anyone know if introducing
Alumina (Al2O3) to the system will cause a contamination problem for others?
Any experience that will help calm my co-workers or save me from contaminating
an expensive piece of equipment would be greatly appreciated.

Thanks,
Marie Tripp