Hi Aamer,

I've receintly been working on this topic and found a good reference.

K.R. Williams, K. Gupta, and M. Wasilik, "Etch Rates for Micromachining
Processing - Part II," Journal of Microelectromechanical Systems, Vol 12, No. 6,
Dec 2003, p. 761-778.

It will answer many of your questions below.

Cheers,
Marie

        -----Original Message-----
        From: [email protected] on
behalf of Aamer Mahmood
        Sent: Thu 2/26/2004 18:08
        To: [email protected]
        Cc:
        Subject: [mems-talk] Aluminum Oxide etchant



        Hello everyone,This is my first post to the group.
        I have searched this topic in the archives but haven't found a spot on
        answer.
        I need to sputter Aluminum Oxide on top of Spin on Glass and then
        pattern and etch the Oxide.
        What etchants can I use for the Aluminum Oxide etch?
        Any particular masking materials or just the photoresist would do?
        How does Aluminum Oxide react to CF4 (SOG etchant)?
        Conversely, how does SOG react to the Aluminum Oxide etchant?
        Any info on the selectivity of the etchants would also be helpful.
        Regards.

        Aamer Mahmood
        Graduate Assistant
        Microsensors lab
        Department of Electrical Engineering
        University of Texas at Arlington
        Arlington TX 76019
        email: [email protected]


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