Dear Han Chong,

Thank you for your information.
I have one last question, is there any way to increase
the adhesion between SU-8 and substrate so that even I
extend the etching time it will not peel off? The
substrate that I use is Si heavy n-doped.

as I know, Su-8 will have average adhesion with Si,
and HF will increase the adhesion capability. However,
is there any additional layer I need to deposit before
I coat with SU-8 in order to increase the adhesion?

Thank you once again,
Haroon
EECS
University of California, Irvine

Message: 11
Date: Thu, 04 Mar 2004 22:56:00 -0500
From: "chong hanwoo" 
Subject: [mems-talk] Re: Message 10. SU-8 on strong
acid
To: [email protected]
Message-ID: 
Content-Type: text/plain; charset=us-ascii

A well prepared SU-8 pattern can withstand most of the
strong acids
even at elecvated temperature. From experience, SU-8
didn't seem to be
seriously affected by HF or HNA. But beware of the
possibility of SU-8
peeling off from the wafer if the etching time is
extended.

regards

Han Chong

>Date:          Wed, 3 Mar 2004 22:32:23 -0800 (PST)
>From:          Haroon Lais  [add to
>address book]
[protect or block sender]
>Subject:       [mems-talk] SU-8 on strong acid
>To:    [email protected]
>Reply To:      General MEMS discussion


>Hello all,

>Do anyone know that SU-8 can stand strong acid like
HF, HNA >?

>I want to use the SU-8 as the mask layer on
patterning >Silicon.
>also, do anyone know what kind of polymer will stand
on >strong acid
like HF, or HNA?

>thank you,
>Haroon




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