Jo-

You can use a 5%O2/95%Cl2 mixture to etch chromium. Without the oxygen,
chromium will etch very slowly. You should be able to get about 500
angstroms per minute with at least a 2:1 selectivity to your photoresist
mask. Silicon oxide is also a good mask to use for this process. Chromium
plasma etching tends to deposit a black film on the chamber walls. Make sure
you keep you manually clean your chamber with isopropanol periodically.

Michael Marrs
Process Engineer
Trion Technology
+1 (480) 968-8818 ext. 25
[email protected]