Hi all,

I am looking for vendors that provide epi wafers with heavily boron-doped
epi layer on a lightly-doped silicon substrate. Structures will be created
in the p++ layer, which will serve as an etch stop when using anisotropic
etchants, KOH or TMAH, to remove the p-type substrate. Did anybody use
similar process before and can recommend me good wafer vendors for this
purpose?? Please reply to [email protected] Thanks you!