Hi,

        The standard conditions suggested by manufacturer were working
fine when I use SU-8 25 and 50. I think you can start following the
instruction in the manual of photoresist.

        I don't know whether you would use photoresist dispenser or not,
but try to have consistency when you pour photoresist.

Good luck.

Woo-Jin

------------------------------------------
Chang, Woo-Jin
Research Professor

Center for Advanced Bioseparation Technology
Inha University, Incheon 402-751, Korea

Office: +82-32-860-8735
Fax: +82-32-865-2771
e-mail: wjchang@inha.ac.kr
------------------------------------------

-----Original Message-----
From: Megan Moran [mailto:mora6235@students.rowan.edu]
Sent: Wednesday, March 24, 2004 1:10 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] SU-8 5 Spinning Information

Hello,

My name is Megan and I'm a college student doing a research project
involving photo-lithography.  I need to spin layers of SU-8 5 onto
silicone
dioxide.  The SU-8 layers need to be 1, 4, 5, 10 and 20 micrometers
thick.  Can anyone provide me with (or point me in the direction of)
information about spin speeds and times to get the desired thicknesses?

Also, if anyone has any suggestions as to things to avoid, the best way
to
do this, baking times, etc. that would be greatly appreciated as well.

Thanks in advance for your help,

Megan
mora6235@students.rowan.edu