Hi Abhiram,

A photoresist sacrificial layer could be removed using Acetone without damaging
your SU-8 if it is properly cured.
But just beware of the possibility of chemical change in the sacrificial layer
as a result of solvent intermixing at the photoresist interface.

regards

Han

>>Hi all,

>>my name is abhiram govindaraju and i am currently working >>on a research
project which involves testing of the >>mechanical properties at the micron
scale specimens. i >>would like to know if anyone has used a photoresist layer
>>as a sacrificial layer to make SU-8 specimens at the >>micron scale, say 100 x
>>20 x 5 microns.

>>for the SU-8 specimens, releasing such small specimen is a >>problem as the
cantilever beam does not have enough >>stiffness and they start to curl
over.Si02 can't be used >>as a sacrificial layer as BHF would react and effect
the >>SU-8 structure while we use it to etch of the Si02 layer.

>>so i thought why not go for a very low material properties >>photoresistlayer
which can be used as a sacrificial >>layer.so could any one of you help me in
finding the right >>material and the right etchant to remove the sacrificial
>>layer.

>>thanking you.

>>regards
>>abhiram.




____________________________________________________________
Find what you are looking for with the Lycos Yellow Pages
http://r.lycos.com/r/yp_emailfooter/http://yellowpages.lycos.com/default.asp?SRC
=lycos10