I have been having success lately with ashing in a vacuum furnace at 680 C
for 30 min followed by ultrasonic cleaning for 90 min. in a mild acid or
caustic solution.  There are other methods for removal at:
http://aveclafaux.freeservers.com/SU-8.html

Good luck,

Eddie Blackwell
Graduate Research Assistant
Multiscale Fabrication
Industrial & Manufacturing Engineering
Oregon State University
503-806-1817


----- Original Message -----
From: "Tingrui Pan" <>
To: "General MEMS discussion" <>
Sent: Sunday, July 04, 2004 11:23 AM
Subject: [mems-talk] SU-8 Removal


> Dear Colleagues,
>
> Does anyone have any experience on removing SU-8 layer after
> photolithography (with or without hard bake)? I need to use SU-8 as a mold
> to do electroplating and SU-8 should be removed eventually. Thank you very
> much for any of your suggestion,
>
> -----------------------------------------------
> Tingrui Pan
> Ph.D. Candidate
> Electrical Engineering
> University of Minnesota
> Phone:   612-626-7188 (Lab)
>          612-624-5034 (Office)
> Website: www.ece.umn.edu/groups/umbmlab
> -----------------------------------------------
>
>
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