Shantanu,

I have the same tool and use it to grow Si3N4.  I was having the same problem
until I got my recipe correct.
I found that until the refractive index of my film matched what Si3N4 should be,
I got soft material hanging from the chamber walls.  Now I don't.  Every 5 to
10um for growth I do a CH4 run
to clean the system.

Good Luck

Brent

Shantanu wrote:

>
> I am using oxford plama 80+ PECVD system to grow silicon dioxide on silicon.
After every growth flaky material deposits on the wall of the chamber. Does
anyone know anything about this?
>
> Best Regards
> Shantanu
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