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MEMSnet Home: MEMS-Talk: UV Cure of Thick Photoresist
Silicon nitride membrane : wafer dicing problem
2004-07-06
Mahavir Sanghavi
2004-07-06
Shile
2004-07-06
Jim Beall
UV Cure of Thick Photoresist
2004-07-08
Eric Miller
2004-07-06
David Springer
UV Cure of Thick Photoresist
Eric Miller
2004-07-08
Can anyone suggest a robust, thick resist (up to 20 um) UV/hot plate cure
process for AZ9260 or AZ4620 used as a mask in a DRIE Bosch process?  Our
standard process uses either a hot plat or oven, and we would like to find a
process that would maintain better resist sidewall profiles, as well as
increase the selectivity of the mask to silicon.  We are planning to run
some tests using a Fusion M150-PC.


Eric Miller
Em3@watechenter.org
Ph:  206 616-3855
www.watechcenter.org





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