Hello there,

What happens to a 2µm thick Aluminum layer sputtered on top of a silicon
wafer if I do not seal the Aluminum with another material such as
Titanium? I assume the Aluminum will react with the ambient air and a
thin layer of Aluminum-Oxid will grow.

Can anyone give me an idea of how thick this layer is going to grow
under normal conditions (atmosphere:air, T=293K)?
Is that 0.1nm, 1nm, 5nm, 10nm 30nm?
Does anyone know a reference to literature where this is being discussed?


Stephan