Are you using HMDS
(http://www.semicontimes.com/common/glossary.asp?termid=340) ?  Putting a
wafer in a HMDS vapor bath for spinning on photoresist is often necessary
for good resist adhesion.  We used to pour about a few mm in the bottom of a
flat beaker, but the wafer on a little stand to hold it above the liquid,
and cover it for 2 minutes.  The HMDS vapor promotes resist adhesion to
oxide surfaces.

David Nemeth
Senior Engineer
Sophia Wireless, Inc.
14225-C Sullyfield Circle
Chantilly, VA

-----Original Message-----
From: [email protected] [mailto:[email protected]]On
Behalf Of Lee, Duhyun
Sent: Friday, July 16, 2004 8:58 AM
To: [email protected]
Subject: [mems-talk] AZ1512 adhesion on quartz wafer


Dear MEMS talkers,

I'm trying to pattern 5um-width lines with AZ1512 and lift-off process on
the quratz wafer.
But the resist dose not have good adhesion.

What factors do I have to consider and how can I handle those factors?

pre-cleaning? baking? or...



Lee, Duhyun

========================================
[email protected]
Technology Innovation Center(TIC)
Dep. of Advanced Materials Eng.
Sungkyunkwan University, KOREA
Tel +82-31-290-5645
Fax +82-31-290-5644
========================================
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