Hello,



When I am doing glass etching, I coated chromium sacrificial layer to
increase adhesion by sputtering, first. And on this layer, coat photoresist
1818, develop PR and etch Cr. Then after glass is exposed, start to etching
glass.



But, when glass is etching, the edge of sacrificial layer is defected.
Therefore, the side well of channel is very rough, not smooth.

If someone knows the answer how to increase adhesion between glass and Cr,
and Cr and photoresist, please let me know.

Thank you.



Jinkee Lee

Brown Univeristy, Division of Engineering

Ph.D. student@Microfluidics Lab, Tripathi Group.

  http://microfluidics.engin.brown.edu


182 Hope St. Providence RI 02912

Phone: (O) 401-863-3977, (C) 401-339-2771