Actually, anodic bonding has a few requirements that may not be met by the setup
you are attempting.

First, the entire stack has to have the capability of passing current through
it.  If the catalyst material is an electrically insulating material, this will
prevent current flow.

Second, anodic bonding can only occur between Pyrex and a material capable of
oxidation (such as silicon, or iron, or other such material).  It can overcome a
small anti-diffusion layer, such as a thin (up to 100nm) layer of native oxide,
but anything thicker severely limits the bonding process.

Best Regards,

Chad Brubaker

EV Group       invent * innovate * implement
Technology - Tel: (602) 437-9492, Fax: (602)437-9435 e-mail:
[email protected], www.EVGroup.com

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 -----Original Message-----
From:   [email protected] [mailto:[email protected]]  On
Behalf Of mohan adavi
Sent:   Wednesday, August 04, 2004 6:17 PM
To:     [email protected]
Subject:        [mems-talk] silicon-glass anodic bonding



Hi all,

       I am have got the silicon microreactor where i have coated a catalyst on
the channels and now i woud like to do the anodic bonding to the coated
reactor(silicon wafer)

i was trying to do it at 400 Centigrade and also at 650 volts ..0 current.and i
coudnt bond the pyrex glass to the coated reactor ! but i could bond the pyrex
glass to the emplty reactor (without catayst at the same condictions) may be the
coated reactor is rough to do the anodic bonding !

how can i get the bonding to the coated reactor ? is there any method we can
bond the glass to coated reactor which is somewhat rough when compared to
uncoated reactor?

Please help me i am struct here.

Thanking You,

Krishna Mohan Adivi.




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