Hi, Dear MEMS fellows,

I have a question about photoresist stripping with
copper. When I strip the photoresist with PR-3000 with
the presense of Cu, I found some black spots on the Cu
pattern. At first I thought it's resist residue, but
later when I increase the stripping time, there are
even more black spots and also the copper pattern
dimension is somewhat reduced. Then I guess that the
copper may be attacked by the stripper.
Anyone can explain this phenomenon, its effect and
possible solutions? Thanks a lot.

Best regards,
Ebin

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