Clariant's AZ nLOF series of materials provides a negative slope lift off
profile, and is strippable in AZ300T or 400T, which are both NMP based(although
the 400T contains TMAH, which may be a problem), and in AZ Kwik Strip
(dipropylene glycol monomethyl ether [34590-94-8];
tetrahydrothiophene-1,1-dioxide [126-33-0]; polyglycol ether; water), which is
said to be safe for copper.

Best Regards,
Chad Brubaker

EV Group       invent * innovate * implement
Technology - Tel:  480.727.9635, Fax:  480.727.9700  e-mail:
c.brubaker@EVGroup.com, www.EVGroup.com

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 -----Original Message-----
From:   mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org]  On
Behalf Of xpeng@EECS.Berkeley.EDU
Sent:   Thursday, September 23, 2004 1:24 PM
To:     mems-talk@memsnet.org
Subject:        [mems-talk] negative photoresist

Hi,
    I am trying to do liftoff of chrome on top of a copper seed layer using a
negative photoresist. Can someone suggest a neagative photoresist that can be
stripped off with a solution that doesn't damage the copper?
    Thanks.

Jack






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