Hi,

Does anyone has the experience to use PMMA photoresist as mask to dry-etch the
silica nanoparticle (or SiO2)?  What is the selectivity? What gas should I use?

If it is not possible to use PMMA as photoresist, what kind of metal and gas
should I use to do the dry etching of SiO2?

Also have the the same question to dry etching the In2O3 and SnO2.

Thank you for the answer at your convenience!

Have a good weekend!






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