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MEMSnet Home: MEMS-Talk: Thick Photoresist with high transparency
Thick Photoresist with high transparency
2004-10-27
Carsten Dehoff
2004-10-27
Brubaker Chad
Thick Photoresist with high transparency
Brubaker Chad
2004-10-27
Carsten,

One resist that meets your requirements would be AZ N6070, which is a nearly
transparent negative tone photoresist, which uses similar processing chemistry
to the AZP4000 and AZ9000 series (both positive resists).

General spin parameters - 3000 rpm will give ~7-8 µm film thickness. Bake would
be ~2.5 - 3 min at 110C.

Develop in AZ300MIF developer.

Best Regards,
Chad Brubaker

EV Group       invent * innovate * implement
Technology - Tel:  480.727.9635, Fax:  480.727.9700  e-mail:
[email protected], www.EVGroup.com

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 -----Original Message-----
From:   [email protected] [mailto:[email protected]]  On
Behalf Of Carsten Dehoff
Sent:   Wednesday, October 27, 2004 7:30 AM
To:     [email protected]
Subject:        [mems-talk] Thick Photoresist with high transparency

Hi everybody,

does anyone know/have experience with a negative photo resist (and spin
parameters) for a 7-8 um thick PR film?
My problem is that the resist we are using right now is almost black so I
can hardly see my structures underneath the PR (when aligning).

Thanks!

Carsten

Aachen University


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