Hello,

You may also use " Apiezon " vacuum grease. Easy to remove using acetone.
However, be sure that the 50% etch rate variation is not due to chamber
heating, or chamber conditioning : is etch rate is changing smoothly with
the number of wafers, or "randomly" from wafer to wafer ?

Good luck

Florent GRECO

CEA - LETI - Département Optronique - Service Laboratoire Infra Rouge
17 rue des Martyrs
38054 Grenoble cedex 9
FRANCE

Tel : 33 (0)4 38 78 25 97
Fax : 33 (0)4 38 78 51 67
mailto:[email protected]

 -----Message d'origine-----
De :    [email protected] [mailto:[email protected]]
De la part deKarin Buchholz
Envoyé :        mardi 30 novembre 2004 08:44
À :     [email protected]
Objet : [mems-talk] RIE - keep Temp constant

Dear mems talkers,

we have a RIE chamber with temperature control of the 3" carrier wafer.
Since we are just using
 waferpieces we just place these on top of the carrier wafer. It seems
now that these small pieces
 do not have proper thermal contact to the chuck, so the temperature of
the sample is not constant
 from etch to etch and the etch rate also varies by 50per cent...

Do you have any suggestions how to provide good thermal contact? The
manufacturer suggested
Fomblin vaccuum oil, but it is impossible to remove it from the samples
after etching...

I appreciate any help! Have a nice day,

Karin


--
Dipl.-Ing. Karin Buchholz
Walter Schottky Institut
Technische Universitaet Muenchen


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