hello all,

   I am using MJB4 mask aligner doing photolithography. The technical
part of the manual didn't tell the lamp power for exposure. I need to
know how much mw/cm2 it will provide so that I can compare with the
exposure dose of photoresists in mj/cm2. I can't find anything on the
web. Can anyone give any advice? Thanks

   By the way, I also want to know whether we can expose PMMA under UV
light instead of normal Ebeam exposure? I have tested under my mask
aligner to expose 150nm 950PMMA for 20sec, but after I put it in 1:3
MIBK:IPA solution for 1min, nothing happened. I saw in my technical
reference that the exposure dose of PMMA is around 500mj/cm2, which is
similiar to the AZ9260 I have been dealing with, and so I applied a
similar exposure time. I dont' understand why it is not developed.

  cheers

  Jiang