Dear colleagues,

Vapor HF etching of the sacrificial layer has been widely used in MEMS
fabrication. Does anyone have any good experience with a Vapor HF tools
(i.e. FSI, Semitool, AMMT, etc) that is suitable for both R&D and
production. This requires good uniformity across the 6'' or larger wafers,
good wafer to wafer consistency, minimal stiction problems, and predictable
etch rates. any information would be greatly appreciated.


thanks!


Ning Chen
MEMS Processing Engineer