Hi,
Sorry to file this request but does anyone happen to have
a soft copy of the following 2 papers? Thanks in advance.

N. LaBianca, and J. Delorme, "High aspect ratio resist for
thick film applications", in Proc. SPIE vol. 2438, SPIE,
(1995) : 846-852 : the first (?) attempt to use thick
layer of SU-8. By the IBM team.
N. LaBianca, J. Gelorme, K. Lee, E. Sullivan,and J. Shaw,
"High aspect ratio optical resist chemistry for MEMS
applications", in Proc. 4th Int. Symp. on Magnetic
Materials, Processes, and Devices, The Electrochem. Soc.,
95-18 (1995), pp.386-396


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