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MEMSnet Home: MEMS-Talk: Vapor HF releasing
Vapor HF releasing
2004-12-08
Ning Chen
2004-12-11
Jan Lichtenberg
2004-12-09
ZICKAR Michaël
Vapor HF releasing
ZICKAR Michaël
2004-12-09
Hi Ning,

We were looking into different HF Vapor etching systems at IMT. For MEMS mass
production I would look into the system of Primax (primax.com). This is the
first etcher that was developed for MEMS fabrication. However the price and
maintenance is high. If you are looking for a very affordable set-up look into
idonus.com. They make systems that can easily be used for R&D and small
production series (100 wafers/year). The uniformity is about the same as with
the Primax system and they can show you some nice processes as "dicing free
release", etc. If you need any other information contact me directly.


Regards

Michael

________________________________

Von: mems-talk-bounces@memsnet.org im Auftrag von Ning Chen
Gesendet: Mi 08.12.2004 01:43
An: 'mems-talk@memsnet.org'
Betreff: [mems-talk] Vapor HF releasing



Dear colleagues,

Vapor HF etching of the sacrificial layer has been widely used in MEMS
fabrication. Does anyone have any good experience with a Vapor HF tools
(i.e. FSI, Semitool, AMMT, etc) that is suitable for both R&D and
production. This requires good uniformity across the 6'' or larger wafers,
good wafer to wafer consistency, minimal stiction problems, and predictable
etch rates. any information would be greatly appreciated.


thanks!


Ning Chen
MEMS Processing Engineer

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