Hello Al,

I wonder if SU8 is a good candidate for ebeam lithography since I know below 350
nm, it behaviour can be difficult. Also, has someone try to see the resolution
obtained with EBL and SU8

Is it possible to make successive exposition-developpement on a thick layer of
SU8, in order to pattern higher aspect rations, if a good resolution table
permits to positionate the sample exactly at the same place?

many thanks
Joe


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