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MEMSnet Home: MEMS-Talk: Uniformity of AZ P4620 Photoresist
Uniformity of AZ P4620 Photoresist
1998-03-18
St. Clair Loren
Uniformity of AZ P4620 Photoresist
St. Clair Loren
1998-03-18
I am attempting to spin AZP4620 at ~10um.  I have used many variations
on the manufacturer's specified recipe for a 10um coat.  After the
prebake the uniformity is not that good.  I would like uniformity as I
would expect in OCG 825 or Shipley 1818.  Q1: what Should I expect for
uniformity.  Q2: are there any key points in the application of the PR
that you can share.  THANKS


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