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MEMSnet Home: MEMS-Talk: Quality of sputtered Si3N4 films
Quality of sputtered Si3N4 films
2005-02-22
amol kumar singh
2005-02-23
Michael D Martin
2005-03-05
Pradeep Dixit
What RGA to buy
2005-03-06
Andrew Xiang
Quality of sputtered Si3N4 films
Michael D Martin
2005-02-23
Hi Amol,
    Standard sputtering of SixNy is problematic for use in MEMS
devices. First it has a low sputter yield, so it takes a long time to
deposite a resonable thickness. Second, and probably most important,
these films always have lots of pin holes. So I would not count on these
films for a masking layer.

-Mike Martin

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