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MEMSnet Home: MEMS-Talk: AZ4620 Removal after High temperature Bake
AZ4620 Removal after High temperature Bake
2005-03-09
Michael
2005-03-10
Kasman , Elina
2005-03-11
CY Hsieh 謝吉勇
2005-03-14
Russell Davies
AZ4620 Removal after High temperature Bake
Michael
2005-03-09
hello,

I am getting some problems with PR removal in my process. The 10um AZP4620 had
to be baked at 210 degree for 40 mins in the previous process. I tried
Piranha(1:4 H2O2: H2PO4), but it also attacks the polymer(BCB) underneath,
Acetone and RIE(100mT, 200W, 50O2) shows no significant cleanning in 10 mins.
Any one can give me some suggestions. I really appreciate that.

Michael

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