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MEMSnet Home: MEMS-Talk: photoresist or polyimide sacrificial layer
photoresist or polyimide sacrificial layer
2005-05-03
Rihui He
2005-05-04
Isaac Wing Tak Chan
2005-05-05
[email protected]
photoresist or polyimide sacrificial layer
Isaac Wing Tak Chan
2005-05-04
Rihui,

As far as the reflow property is concerned, they should have no problem.
Bake in oven at 120C will probably reflow the surface better, then bake on
hotplate to harden it. Or you can bake at 150C directly on hotplate. The
problem is you need O2 plasma to ash it after the process. But if you use
it for sacrificial layer, do you mean lift-off? May I ask why you want
it rounded? You can reply me privately.

Yours sincerely,

Isaac Chan, Ph.D.
University of Waterloo

On Tue, 3 May 2005, Rihui He wrote:

> I am planning to use AZ 4620 or AZ 4330 as sacrificial layer for my metal
> device. Are they easy to reflow to form a round edge? Or I may get better
> result by using polyimide?
reply
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