KOH is a typical developer for photoresist.  Did you try hard-
baking the resist before exposure to KOH (say 125 deg. C)?
Don't know about SU8 though.

-Bill
---- Original message ----
>Date: Tue, 10 May 2005 00:59:03 -0400
>From: [email protected]
>Subject: Re: [mems-talk] photoresist mask for KOH etching
>To: [email protected]
>
>Carol,
>
>I don't think resist will work in KOH. I tried using photo
resist  in KOH it just dissolves. I use Nitride as a mask for
KOH.