Try some AZ 4562, about 7 m thick, and good hardbake. With this
resist we etch typically 300 - 350 m in DRIE.


Thomas Overstolz

-----Original Message-----
From: Stephan Biber
Subject: [mems-talk] Photoresist for Silicon DRIE

We want to use the "Bosch-process" for DRIE of silicon structures. Does
anyone know which photoresist is good to provide very high selectivity
to the DRIE process? We want to etch more than 300µm deep with only
one photomask! What is the right resist for this application?