Hello,

I am trying to find a good recipe for achieving 100um thick positive photoresist
on silicon wafers. Currently, we are trying a two layer process using AZ50XT but
there are major problems with poor adhesion of the resist after developing (even
when HMDS is used and the resist is left overnight to rehydrate). Would
appreciate any help on a successful recipe using AZ50XT or what other positive
photoresist could be used. Please contact me as soon as possible. Thank you in
advance,

Best regards,
Jessica Melin