I would switch to an isotropic plasma etch with SF6 and ~10% O2. I think this
chemistry is very selective between silicon and nitride.

-Mike Martin
 U. of Louisville

>>> [email protected] 07/07/05 12:58 PM >>>
Hi guys,
     I am trying to etch Silicon which is deposited on silicon nitride using
HF:HNO3:DI water (Isotropic etch). I would like to protect my nitride layer
beneath my silicon while etching. Can anyone suggest an etch stop for
silicon nitirde while using the isotropic etchant?
                                          regards,
                                          Vinayak


_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

Want to advertise to this community?  See http://www.memsnet.org

To unsubscribe:
http://mail.mems-exchange.org/mailman/listinfo/mems-talk